Nitrogen Trifluoride (NF3) High Purity Gas

Tus neeg saib xyuas hauv kev lag luam hluav taws xob: NF3 tau siv dav los ua tus neeg saib xyuas kev tshem tawm cov khoom seem, xws li oxides, los ntawm cov chaw ntawm cov khoom siv hluav taws xob, cov plasma zaub panels (PDPs), thiab lwm yam khoom siv hluav taws xob. Nws tuaj yeem ntxuav cov chaw no zoo yam tsis muaj kev puas tsuaj rau lawv.

Etching gas hauv semiconductor fabrication: NF3 yog siv los ua cov roj etching hauv cov txheej txheem tsim khoom ntawm semiconductors. Nws yog tshwj xeeb tshaj yog zoo nyob rau hauv etching silicon dioxide (SiO2) thiab silicon nitride (Si3N4), uas yog cov ntaub ntawv uas siv nyob rau hauv lub fabrication ntawm integrated circuits.

Kev tsim cov purity fluorine compounds: NF3 yog ib qho tseem ceeb ntawm cov tshuaj fluorine rau kev tsim cov tshuaj fluorine ntau yam. Nws yog siv los ua tus thawj coj hauv kev tsim cov fluoropolymer, fluorocarbons, thiab cov tshuaj tshwj xeeb.

Plasma tiam hauv vaj huam sib luag vaj huam sib luag tsim: NF3 yog siv nrog rau lwm cov roj ntsha los tsim cov ntshav hauv kev tsim cov vaj huam sib luag tiaj tus, xws li cov kua siv lead ua kua (LCDs) thiab PDPs. Lub plasma yog qhov tseem ceeb hauv cov txheej txheem tso tawm thiab etching thaum lub sij hawm tsim vaj huam sib luag.

Nco ntsoov tias cov ntawv thov tshwj xeeb thiab cov cai rau kev siv cov khoom siv / cov khoom no yuav txawv ntawm lub teb chaws, kev lag luam thiab lub hom phiaj. Nco ntsoov ua raws li cov lus qhia kev nyab xeeb thiab sab laj nrog tus kws tshaj lij ua ntej siv cov khoom siv / cov khoom no hauv txhua daim ntawv thov.